{"created":"2023-05-15T12:31:08.188415+00:00","id":695,"links":{},"metadata":{"_buckets":{"deposit":"fbc3e634-44e6-4907-8684-8cc7f453200c"},"_deposit":{"created_by":6,"id":"695","owners":[6],"pid":{"revision_id":0,"type":"depid","value":"695"},"status":"published"},"_oai":{"id":"oai:fit.repo.nii.ac.jp:00000695","sets":["256:257:367"]},"author_link":["3247"],"item_3_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1998-10-15","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"50","bibliographicPageStart":"43","bibliographicVolumeNumber":"31","bibliographic_titles":[{"bibliographic_title":"福岡工業大学研究論集"},{"bibliographic_title":"RESEARCH BULLETIN OF FUKUOKA INSTITUTE OF TECHNOLOGY","bibliographic_titleLang":"en"}]}]},"item_3_description_17":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_3_description_47":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"論文(Article)","subitem_description_type":"Other"}]},"item_3_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Morooka proposed a brief method for measurement of diffusion profiles of deep impurities based on a capacitance measurement by moving Schottky electrode on an angle-lapped surface. However, the detection limit for the concentration of deep impurities is considerably high by this method, because the depletion capacitance is very small due to the small contact area of the Schottky electrode with the surface. By evaporating a line of metal dots for Schottky electrode, the detection limit was improved less than 1/1000 of the concentration in the previous method, and that is less than 5 X 1012 cm-3. The detection limit and spatial resolution have been discussed. ","subitem_description_type":"Other"}]},"item_3_publisher_37":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"福岡工業大学"}]},"item_3_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"02876620","subitem_source_identifier_type":"ISSN"}]},"item_3_text_38":{"attribute_name":"出版者（ヨミ）","attribute_value_mlt":[{"subitem_text_value":"フクオカ コウギョウ ダイガク"}]},"item_3_text_39":{"attribute_name":"別言語の出版者","attribute_value_mlt":[{"subitem_text_value":"Fukuoka Institute of Technology"}]},"item_3_text_48":{"attribute_name":"資源タイプ・ローカル","attribute_value_mlt":[{"subitem_text_value":"紀要論文"}]},"item_3_text_49":{"attribute_name":"資源タイプ・NII","attribute_value_mlt":[{"subitem_text_value":"Departmental Bulletin Paper"}]},"item_3_text_50":{"attribute_name":"資源タイプ・DCMI","attribute_value_mlt":[{"subitem_text_value":"text"}]},"item_3_text_51":{"attribute_name":"資源タイプ・ローカル表示コード","attribute_value_mlt":[{"subitem_text_value":"02"}]},"item_3_version_type_19":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"MOROOKA, Masami"}],"nameIdentifiers":[{"nameIdentifier":"3247","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_access","displaytype":"detail","filename":"31(1)-43.pdf","filesize":[{"value":"528.5 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"url":"https://fit.repo.nii.ac.jp/record/695/files/31(1)-43.pdf"},"version_id":"64391952-4c59-40d5-961a-f84a6a349f90"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"diffusion profile","subitem_subject_scheme":"Other"},{"subitem_subject":"impurity diffusion","subitem_subject_scheme":"Other"},{"subitem_subject":"deep impurity","subitem_subject_scheme":"Other"},{"subitem_subject":"ICTS, DLTS","subitem_subject_scheme":"Other"},{"subitem_subject":"Schottky contact","subitem_subject_scheme":"Other"},{"subitem_subject":"Schottky electrode","subitem_subject_scheme":"Other"},{"subitem_subject":"Si.-Au","subitem_subject_scheme":"Other"},{"subitem_subject":"diffusion profile","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"impurity diffusion","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"deep impurity","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"ICTS, DLTS","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Schottky contact","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Schottky electrode","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Si.-Au","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Improvement in Sensitivity for Brief Measurement of Diffusion Profiles of Deep Impurities in Semiconductors Based on a Capacitance Measurement on an Angle-Lapped Surface","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Improvement in Sensitivity for Brief Measurement of Diffusion Profiles of Deep Impurities in Semiconductors Based on a Capacitance Measurement on an Angle-Lapped Surface"}]},"item_type_id":"3","owner":"6","path":["367"],"pubdate":{"attribute_name":"公開日","attribute_value":"2021-02-25"},"publish_date":"2021-02-25","publish_status":"0","recid":"695","relation_version_is_last":true,"title":["Improvement in Sensitivity for Brief Measurement of Diffusion Profiles of Deep Impurities in Semiconductors Based on a Capacitance Measurement on an Angle-Lapped Surface"],"weko_creator_id":"6","weko_shared_id":-1},"updated":"2023-05-15T12:40:40.482608+00:00"}